V-200H Vacuum Bonder
- No adjustment necessary for different substrate thicknesses
- Suitable for all heatable types of tapes and films
- Table-top device, minimal footprint
- Note: Frame must be mounted with tape previously
Video
Technical Data
| Substrate size: | 6" to 8" |
| Substrate type: | Flat surface |
| Substrate thickness: | 80µm to 3mm |
| Maximum height of structures/bumps: | 170µm |
| Maximum temperature: | 100°C / 212°F |
| Cycle time: | ~1 minute average per bond (up to 60 bonds/hour) |
| Tape compatibility: | UV-release dicing tape and thermal (heat) release tape — compatible with all heatable tape types |
| Frame size: | Ø8" DTF 2-8-1 / Ø6" DTF 2-6-1 |
| Frame type: | Disco or K&S, Steel only |
| Frame material: | Steel |
| Width: | 385 mm (15.2") |
| Depth: | 600 mm (23.6") |
| Height: | 815 mm (32.1") |
| Weight: | 40.4 kg (89 lbs) |
| Temperature control unit: | Separate unit (×2 per device), 260 × 240 × 180 mm (10.2" × 9.4" × 7.1"), 9 kg (20 lbs) each |
| Vacuum requirement: | 2 mbar absolute (1.5 Torr), Festo PUN-10, Ø10 mm |
| Pumping speed (recommended): | 19 m³/h (11.2 ACFM), at atmospheric inlet conditions |
| Pressure requirement: | 4 - 6 bar (60-90 psi), Festo PUN-4, Ø4 mm |
| Power input: | 100 - 240 VAC, 50/60 Hz |
| Control interface: | Touchscreen control panel, password-locked parameters for production runs (no recipe storage) |
| Clean room application: | in use up to ISO 4 - 5 |
| A-weighted emission sound pressure level: | does not exceed 70 dB(A), excluding vacuum pump |
| Peak c-weighted instantaneous sound pressure value at workstations: | does not exceed 63 Pa, excluding vacuum pump |
| Country of manufacture: | Switzerland |
| Certification: | CE Certified, IEC 204-1 safety standards |
| Warranty: | 12 months (extendable up to 24 months) |
Product Description
This device is specifically designed to maximize the degree of automation in the bonding process for structured substrates or bumped wafers. Only the handling steps remain manual — this ensures equipment longevity and saves on space and cost for the customer. In fact, the V-200H does not consist of any electromechanical actuators, which guarantees a maximum MTBF (mean time between failures) and no periodic consumables.
Customers who choose this device typically demand:
- a proper contact between the tape and around the structures (bumps) on the wafer
- a high degree of process repeatability and independence of human errors
- the substrate must be uniformly brought into contact with the tape over its entire surface (no transversal movement)
- a device which does not require any adjustment for different substrate thicknesses
Applications
The V-200H is well suited to R&D and pilot-line environments, as well as low-to-mid volume production, where flexibility across substrate types matters more than cassette-to-cassette throughput. Its lot-size-one capability makes it a practical fit for process development and qualification trials before scaling to full production. Beyond standard silicon wafers, the V-200H accommodates a range of substrate materials — including glass and ceramic — provided they fall within the specified thickness and structure height limits.
Operation
It is important to understand that the V-200H requires a frame to be mounted with a tape beforehand. Once that is prepared, the substrate and the mounted frame are placed onto separate sides of the V-200H chamber. Once the cover is closed, the V-200H will evacuate the chamber to approximately 3 mbar and then automatically bring both the structured substrate and the tape into uniform contact with each other. By applying a vacuum, a bubble-free and homogeneous bond is ensured. Finally, the chamber can be opened and the substrate bonded onto the tape and frame can be retrieved. Parameters such as temperature, pressing force, vacuum level, and timing can all be adjusted via the device HMI or the temperature control unit.
Flexibility
A special strength of the V-200H is its modular design. The exchange of chucks for different substrates can be done within less than 1 minute. There is no height adjustment necessary of the chuck. It is important to note that different substrate sizes do not always require a different chuck to be used. Besides the standard heated chuck, ask about our wide range of customized chucks of any special shapes. The V-200H operates independently of any specific type of tape, so long as it is intended for heated processes.
Limitations
The V-200H requires a frame to already be mounted with tape before use — a separate frame mounter is needed to prepare this beforehand, as the V-200H does not perform this step itself. Additionally, since bonding is achieved through vacuum only, with no mechanical press mechanism, the maximum applied pressure is limited to atmospheric pressure.
Options & Accessories
Options
Heated Chuck for 2″- 6″ Substrates
The chuck includes a rubber mat which passively keeps the substrate from moving while the vacuum chamber is evacuated.
Accessories
Performance optimized for use with the V-Series; eligible for use in clean room applications up to ISO 6/Class 1000.
110-240 V, 50/60 Hz.
Performance optimized for use with the V-Series; eligible for use in clean room applications up to ISO 6/Class 1000.
110-240 V, 50/60 Hz.
Product Variants
Variants on commission:
- Larger substrate thickness
- Wafer theta alignment features on the chuck
- fully automated solution with 6-axis robot system. Casette to casette handling.
Downloads & FAQs
Downloads
FAQs
Can I have my samples tested by a V-200H at POWATEC?
YES. If you are seriously interested in acquiring a V-200H, but would like to have it tested with your own samples first, then we can offer a free sample testing at our facility. We also support you in the selection of suitable tapes/films, offer free dicing or UV curing, and support you to select the most suitable model for your needs. Furthermore, as a proof of record, we can offer a live stream or video recording to document your samples being processed with the V-200H. Alternatively, we are more than happy to welcome you to visit our facility for an in-person demonstration.
Do I need a separate chuck for each substrate size?
YES. However small differences in the substrate size (+/- 2 mm) can be handled with one type of chuck. But for different substrate sizes such as 4″, 6″ or 8″ a dedicated chuck is necessary. The exchange of the chuck is done within seconds.
What is the minimum substrate thickness the device can support?
The minimum substrate thickness on the standard device is 80µm, however, with minor adaptations there is no limit to the minimum thickness of a substrate that can be mounted.
What is the maximum thickness of the substrate?
With the standard chuck it is possible to mount substrate up to 3mm in thickness and structures/bumps with a maximum height of 170µm. Larger dimensions are possible with a simple customized design.
Do I need to make adjustments for different substrate thicknesses?
NO. No adjustments are needed, which is a great advantage of the V-200H.
Does POWATEC offer chucks for square wafer / glass substrate / multiple substrates at once / very small wafers or fraction of wafers?
YES.
What has to be done by the operator?
- Place the wafer and the mounted frame in the V-200H chamber
- Close the chamber and press start
- Open the chamber when the process is finished and retrieve the wafer on tape and frame

