VA-200 Advanced Vacuum Bonder
Engineered for performance and control, this device delivers fully automated core processes for the highest level of repeatability by leveraging:
- Heated top and bottom chucks with independent temperature controls
- Heating range up to 150°C/300°F
- A compact vacuum chamber that operates under 5 millibars of pressure
- Fully customizable process steps durations to fully control temperature gradients
- “Recipe” feature to save up to 10 favorite programs
Video
Technical Data
| Wafer size: | up to 6" |
| Wafer type: | flat surface |
| Wafer thickness: | 80µm to 3mm |
| Maximum temperature: | 150°C / 300°F |
| Frame size: | Ø8" DTF 2-8-1 |
| Width: | 402 mm |
| Depth: | 670 mm |
| Height: | 686 mm |
| Weight: | 46 kg |
| Vacuum required: | 2 mbar absolute, at least 16 m^3/h |
| Pressure required: | 4-8 bar |
| Cooling Water requirement: | up to 4 bar, 10-20oC |
| Power input: | 110-240 VAC |
| Peak power consumption: | 1190 W |
| Clean room application: | in use up to ISO 4 - 5 |
| Certification: | CE Certified, IEC 204-1 safety standards |
Product Description
Manufactured and developed in Switzerland, the VA-200 Wafer Mounter from Powatec is the ideal device for precisely bonding substrates to films, carriers, other wafers, and more..
The VA-200 was originally developed for a Silicon Carbide application and thus named the V-150 SiC, but it has since been rebranded as the VA-200 as its capabilities make this device an ideal solution in countless applications.
Key Features
A unique setting of the VA-200 bonder is the adjustable duration of the mounting step. This setting ensures that the contact surface between the tape and wafer reaches a predetermined temperature when pressed together before moving on. This not only generates an extremely high-quality mount, but it also makes the process highly repeatable and consistent.
At the heart of the device is its precision-controlled vacuum chamber, which ensures an environment that optimizes wafer placement and adhesion, reducing defects and improving yield.
Operation
- Place the wafer and tape-mounted frame into the chamber and set the desired temperature for each chuck, up to 150°C.
- Once the “start” button is pressed, the device will proceed to execute the user-defined process steps automatically.
- After pre-heating is complete, a vacuum is quickly created in the chamber and the wafer, frame, and tape are brought into contact with each other free of any air enclosures.
- The tape and wafer are brought together at two different temperatures, so the device will hold the stack together for a period until the ideal temperature gradient is reached by the contact surface.
- The mounted assembly is then lowered to the original position, the chamber is refilled with air, and the device opens the chamber for the removal of the sample.
Recipe System
The VA-200 can store up to 10 process recipes directly on the device, so a proven set of parameters is ready to run again with a single selection — no need to re-enter settings between jobs or operators.
Software & Process Modes
The VA-200’s control software runs in two distinct modes, so the same machine supports both process development and day-to-day production without compromise:
- Develop Process mode gives engineers full manual control over every process step — chamber timing, chuck speed, pressing force, and temperature gradients — for tuning a new process or qualifying a new material before it goes to the floor.
- Select Recipe mode locks operators into running a saved, validated recipe with a single selection, removing the chance of an operator changing a parameter mid-run. This is the mode used in production, where repeatability matters more than flexibility.
Access to Develop Process mode and recipe editing is protected by a configurable PIN, so production operators can run saved recipes freely while process changes stay limited to authorized personnel. The system also monitors for lid-mechanism obstructions during the automated cycle and will pause and alert if it detects a fault, so issues get caught rather than forced through.
Flexibility
The device’s flexibility allows the user to even control the duration of the pre-heating step, the speed at which the chamber opens and closes, the speed at which the bottom chuck lifts and lowers, and the force used to press the wafer and tape together.
Options & Accessories
Accessories
Performance optimized for use with the V-Series; eligible for use in clean room applications up to ISO 6/Class 1000.
0.55 kW, 110-240 V, 50/60 Hz.
Performance optimized for use with the V-Series. Supplied with an active carbon filter and gas particle absorber developed by POWATEC, which enables it to be used in clean room applications up to ISO 1/ >Class 1.
0.55 kW, 110-240 V, 50/60 Hz.
Product Variants
For inquiries on these products or customizations, please contact Powatec for full details.
Downloads & FAQs
Downloads
FAQs
Can POWATEC perform sample tests?
YES. If you are seriously interested in acquiring a VA-200, but would like to have it tested with your own samples first, then we can offer a free sample testing at our facility. We also support you in the selection of suitable tapes/films, offer free dicing or UV curing, and support you to select the most suitable parameters for your application. Furthermore, as a proof of record, we can offer a live stream or video recording to document your samples being processed with the device. Alternatively, we are more than happy to welcome you to visit our facility for an in-person demonstration.
Does the VA-200 also mount the tape to the frame?
NO. To use the VA-200, it is necessary to first mount the tape to the frame. It is therefore recommended to have either a POWATEC Manual Wafer Mounter (P-200), or a Frame Mounter (FM-200). However, any other wafer mounter on the market should be able to prepare the tape on the frame.
What is the minimum substrate thickness the device can support?
The minimum substrate thickness on the standard device is 80µm.
What is the maximum thickness of the substrate?
With the standard chuck it is possible to mount substrates up to 3mm in thickness and structures/bumps with a maximum height of 170µm. Larger dimensions are possible with a simple customized design.
Do I need to make adjustments for different substrate thicknesses?
NO. No adjustments are needed, which is a great advantage of the VA-200.
Is this device only suitable for Silicon Carbide wafers? Or can it be used for other types as well?
The VA-200 is suitable for any application and wafer material that requires a high quality mount with tight process controls and the flexibility to heat the wafer and tape at different temperatures. The tool was originally developed for a Silicon Carbide fab, hence the name, but it is not limited to any specific material.







